Nordiko 2000 - 4 Targets Thin Sputtering Deposition System

1. RF - Magnetron Configuration
2. The Machine uses 6"targets
3. The system can accommodate up to circular  6" (diameter) samples, it has custom-made AL plates that seat on the system holders and can accommodate up to x7  75x25mm glass slides.
4.  The base pressure when the last time the machine was used, was between 10^-5 and 10^-6 mbars.

This system was removed from a university Physics & Electrical Engineering Department as surplus to requirements. It was used in a university lab for research and for building solar cells (200 to 300 nm thin film layers of material per deposition) the machine was routinely cleaned with vacuum cleaners and brush for avoiding cross-contamination during the depositions. The machines will contain small residues of various materials inside the main vacuum chamber. List of materials for used: Cu, Zn, In, Sn, Mo, Al, Ni, InO2:SnO2, Au, for the Kurt Lesker (picture 2): Cu, Au, Zn, In, Sn, Bi, Sb, Mo, Al, Ni, ZnO, SnO2, InO2:SnO2, ZnO:Al, Mo:Na.

This system has four targets and can accommodate 20 samples at the same time (each sample is a 25x75mm glass slide) and can deposit all sorts of material.

Prior to decommissioning in May 2021 it was fully operational. We were told by the lab manager that this machine still works as it should be but would require service by a competent engineer. The software system has been upgraded about 3 years ago.

Please enquire for further details - we can conduct inspections on the unit, or happy for you to view, etc.